ECCN 3E992
NSRSATTechnology for the production or development of commodities specified in 3B001.a.4, c, d, f.1, f.5, f.6, k to n, p.2, p.4, r; and 3B002.c; and technology as follows .
Items Covered
- a."Technology" specially designed for the "development" or "production" of commodities specified in 3B001.a.4, c, d, f.1, f.5, f.6, k to n, p.2, p.4, r; or 3B002.c.
- b."Technology" not specified by 3E992.a designed or modified to perform all of the following in or with deep-ultraviolet immersion photolithography equipment:
- 1. Decrease the minimum resolvable feature specified by 3B001.f.1.b; and
- 2. Decrease the maximum 'dedicated chuck overlay' of deep-ultraviolet immersion lithography equipment below or equal to 1.5 nm.
Control Reasons
NSNational Security
Items controlled for national security reasons under multilateral export control regimes.
Column 1: YesColumn 2: No
RSRegional Stability
Items controlled for regional stability reasons.
Column 1: YesColumn 2: No
ATAnti-Terrorism
Items controlled for anti-terrorism reasons. Most items on the CCL have AT controls.
Column 1: YesColumn 2: No
Disclaimer
This information is for reference only. For official classifications, consult BIS or a qualified export control professional.