ECCN 3D993
RSATSoftware for the development or production of commodities specified in 3B993 and software as follows .
Items Covered
- a."Software" specially designed for the "development" or "production" of commodities specified in 3B993.
- b.'Electronic Computer-Aided Design' ('ECAD') "software" designed or modified for the "development" or "production" of integrated circuits using multipatterning.
- c.'Computational lithography' "software" designed or modified for the "development" or "production" of patterns on DUV lithography masks or reticles.
- d."Software" designed or modified to increase the number of wafers processed per hour, averaged over any time interval, by greater than 1%, of equipment specified in 3B001.f.1 or 3B993.f.1.
- e."Software" not specified by 3D993.a designed or modified to perform all of the following in or with deep-ultraviolet immersion photolithography equipment:
- 1. Decrease the minimum resolvable feature specified by 3B993.f.1.b.1; and
- 2. Decrease the maximum 'dedicated chuck overlay' of deep-ultraviolet immersion lithography equipment above 1.5 nm and below or equal to 2.4 nm.
Control Reasons
RSRegional Stability
Items controlled for regional stability reasons.
Column 1: YesColumn 2: No
ATAnti-Terrorism
Items controlled for anti-terrorism reasons. Most items on the CCL have AT controls.
Column 1: YesColumn 2: No
Disclaimer
This information is for reference only. For official classifications, consult BIS or a qualified export control professional.