ECCN 3D003
NSAT'Computational lithography' software specially designed for the development of patterns on EUV-lithography masks or reticles.
What This ECCN Covers
ECCN 3D003 controls "computational lithography" software specially designed for the development or production of items tied to advanced semiconductor manufacturing, as defined in the entry. This design-side software (e.g., for resolution enhancement and mask synthesis) is controlled for National Security and Anti-Terrorism reasons.
Who needs to check this?
EDA and lithography-software vendors providing computational-lithography, OPC, or mask-synthesis tools for advanced chip production.
Compliance tip
Identify the exact capability the entry controls — computational-lithography software is a focused, evolving control area tied to leading-edge fabrication. Verify the §734.7 "published" exclusion for any publicly available code, and treat advanced-node uses with heightened §744.23 diligence.
Control Reasons
Items controlled for national security reasons under multilateral export control regimes.
Items controlled for anti-terrorism reasons. Most items on the CCL have AT controls.
Disclaimer
This information is for reference only. For official classifications, consult BIS or a qualified export control professional.